High-pulsed power supply

Excitation energy to ensure the coatings with high density plasma, the high power pulsed magnetron sputtering (HIPIMS)power can help you obtain good coating results.

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Excitation energy to ensure the coatings with high density plasma, the high power pulsed magnetron sputtering (HIPIMS)power can help you obtain good coating results.

• The obtained film has excellent performance in terms of homogeneity, hardness, abrasion resistance and viscosity
• Can be used as an alternative to DC magnetron sputtering power supply, the use of existing magnetron sputtering system, without the need for equipment modification
• Multiple ionization and ion directed so that it can be used for channel filling and other processes

Features:
• Power up to 8 MW
• Arc reaction sensitivity
• Pulse duration and frequency setting
• Real time control and monitoring pulse
• Back interface

Customer benifit:
• High flexibility, applicable to a variety of scientific research and industrial processes
• Magnetron sputtering without droplets, minimal surface damage
• Convenient to match with existing cathode system and process condition
• Make full use of the target
• Best device connection settings

Product Power supply Output Output Cooling method
[kW] Voltage Current
  [V] [A]
TruPlasma 4001 High power pulse power supply 1000 1000 1000 Air cooling
TruPlasma 4002 High power pulse power supply 2000 2000 1000 Air cooling
TruPlasma 4006 High power pulse power supply 6000 2000 3000 Air cooling
TruPlasma 4008 High power pulse power supply 8000 2000 4000 Air cooling

 

TruPlasma Highpulse 4000 for the high power pulse power supply in high power pulsed magnetron sputtering (hipims) technology is the best choice for you. As the latest development of pulsed PVD sputtering process, the HIPIMS process can be made into a hard film with excellent corrosion resistance and wear resistance.
The highest power of the series is up to 8 MW, which can produce ultra high plasma density and high ion current density. Basically, the arc discharge device is the same, but the HIPIMS technology is not used to produce the phenomenon of material droplets (droplets). The TruPlasma Highpulse TruPlasma 4000 high power pulse power series can be applied to semiconductor manufacturing processes, such as etching, surface pretreatment and channel filling by combining with the bias voltage system.
Power supply parameter