DC power supply

DC power supply

Plasma excitation in the field of masterpiece, plasma excitation technology becomes the primary economic process. The plasma excited DC power series can be used for the single cathode system, the dual cathode system, and the magnetization treatment of the substrate.

>> Detail
MF power supply

MF power supply

MF power supply, this device can ensure our professinal products with large coating area and high sputtering rate. Comparing with DC power supply in series, it has higher stability; and relating to the high frequency power supply, solutions are more economic. It can be a good choice for high dep

>> Detail
RF power supply

RF power supply

For the micro process to macro products, the RF power series can make the processing technology with high stability, so it is often used in the production of micro components. The series power will help you succeed when the power supply scheme cannot be effectively implemented.  

>> Detail
Arc power supply

Arc power supply

Hard coating with excellent performance by vacuum arc ion plating, obtained by vacuum arc ion plating.

>> Detail
Bias power supply

Bias power supply

Every magnetron sputtering process can be supported by bias power supply: Bias TruPlasma 3000 / 4000 bias power series is a wide range of applications, advanced DC bias power supply. Whether for in materials processing, dry moment and bias of the film deposition applications or for PVD technology

>> Detail
High-pulsed power supply

High-pulsed power supply

Excitation energy to ensure the coatings with high density plasma, the high power pulsed magnetron sputtering (HIPIMS)power can help you obtain good coating results.

>> Detail
Bipolar pulse power supply

Bipolar pulse power supply

The dual cathode system is designed to improve the accuracy by using the variable waveform.

>> Detail