In order to reduce the number of targets used in the sputtering system, an alloy film conforming to the composition and performance requirements can be sputter-deposited with one target as much as possible, and alloy targets, composite mosaic targets, and multi-target sputtering can be used.

In general, in the steady state of discharge, various constituent atoms are subjected to sputtering according to the composition of the target, and sputtering coating is superior to vacuum evaporation and ion plating in that the composition of the layer and the target are The composition difference is small and the coating composition is stable. However, in some cases, due to the selective sputtering of different constituent elements, the reverse sputtering rate of the film layer, and the adhesion, the composition of the film layer and the target may be greatly different. In order to obtain a film of a certain composition, in addition to formulating a specific ratio of the target according to the experiment and minimizing the temperature of the target, the substrate temperature may be lowered to reduce the difference in adhesion rate and selected. Suitable process conditions minimize the reverse sputtering of the film.

In some cases, it is not easy to prepare a large-area uniform alloy target or a compound target. In this case, a composite mosaic target composed of single elements can be used, and the composition of the target surface is as shown in FIG. The fan-shaped mosaic structure shown in Figure d has the best effect, and it is easy to control the composition of the film, and the repeatability is also good. In principle, not only binary alloys, ternary and quaternary alloy films can be produced by this method.

When it is required that the components of the alloy film differ greatly, an auxiliary cathode method is generally employed. The main cathode target is made of the main component of the alloy, and the auxiliary cathode target is made of the additive component of the alloy. Each target was simultaneously sputtered to form an alloy film. The amount of added components in the alloy film can be arbitrarily changed by adjusting the current of the auxiliary cathode target.