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Functional film coating machine

HCVAC developed PMA II patented technology on the basis of PMA I technology, and successfully integrated PMA II into a new generation of coating system. The system has flexible configuration and can be combined with ARC, MS, HIPIMS and other technologies to provide more possibilities for the development of new coatings and new materials. It provides a complete coating solutions for tool coating, mould coating, parts coating, DLC coating, GLC coating, ta-C coating, etc.

Compact multifunctional sputtering coating machine

Support load locked sputter coating equipment from R & D to small-scale production.

Diamond like carbon (DLC) coating machine

DLC coating (DLC coating) prepared by DLC coating machine has stable quality, good adhesion with substrate, good wear resistance, low friction coefficient and good corrosion resistance. It is widely used in engine parts, non-ferrous metal cutting tools, non-ferrous metal and stainless steel forming stamping die, sliding sealing parts, semiconductor industry mold, injection mold, textile industry and so on.

HiPIMS sputtering coating system

The hipims-800 combines all the advantages of a classic DC sputtering coating system with the capabilities of the latest hipims technology. The system is equipped with six sputtering cathodes, four of which can work in hipims or DC mode. The other two DC cathodes can be operated, for example, to provide more complex multilayer coatings, provide color and top coating, or simply increase the deposition rate. The absolute combination of these technologies in one process provides a limited range of coating designs at very low production costs.

Custom functional coating machine

For each customer, we tailor-made personalized coating solutions, and integrate them into your existing coating machine, so that you can use the existing coating machine and coating system, combine the whole set of new manufacturing process with your needs, and ensure the rapid and efficient production.

CVD diamond growing system

In this system, microwave plasma is used to increase the reaction rate of precursor and reduce the reaction temperature. It is suitable for preparing high-quality hard films and crystals with large area, good homogeneity, high purity and good crystal morphology.

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E-mail: info@hcvac.com

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