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Magnetron sputtering vacuum coater is widely used in daily life, and it is also very popular in the market. Therefore, everyone pays special attention to the coating technology of magnetron sputtering vacuum coater. Today, Huicheng vacuum editor introduces the main parameters that affect the sputtering of magnetron sputtering vacuum coater.
I. Sputtering threshold: Minimum energy value of incident ions required for sputtering target atoms. It has little to do with the type of incident ions, but it has to do with the target. After the amount of energy ions exceeds the sputtering threshold, with the increase of ion energy, the sputtering yield is proportional to the square of ion energy before 150ev. In the range of 150ev~1kev, the sputtering yield is proportional to the ion energy. In the range of 1kev~10kev, the sputtering yield does not change significantly. With the increase of energy, the sputtering yield shows a downward trend. The following are the sputtering thresholds of several metals bombarded by different incident ions.
II. Sputtering yield: When the incident ions bombard the target, the average number of atoms that each positive ion can hit from the target. The influencing factors mainly include the following aspects:
1. The sputtering yield shows a certain periodicity with the change of target atomic number, and the sputtering yield increases with the increase of electron filling degree of target atom D shell (general change trend).
2. Influence of incident ion species on sputtering yield Sputtering yield increases periodically with the increase of incident atomic number. Sputtering yield of silver, copper and tantalum corresponding to various incident ions of 45Kev.
3. Influence of ion incident angle on sputtering yield. For the same target and incident ions, the sputtering yield increases with the increase of incident angle of ions, and the sputtering yield reaches the maximum when the angle increases to 70 ~ 80. With increasing incident angle, the sputtering yield decreases sharply, and the sputtering yield is zero at 90℃.
4. Influence of target temperature on sputtering yield. Generally speaking, within a certain temperature range that can be considered that the sputtering yield is closely related to sublimation energy, the sputtering yield hardly changes with the change of temperature. When the temperature exceeds this range, the sputtering yield tends to increase sharply.
The above two points are the biggest parameters that affect the sputtering of magnetron sputtering vacuum coating machine. The changes of these two parameters are directly related to the film adhesion, film structure and other characteristics, so the sputtering parameters are extremely important.
