The ion coating technology of pvd coating machine is to achieve coating by gas discharge under vacuum conditions, that is, to ionize the gas or evaporated material in a vacuum chamber, and under the bombardment of gas ions or evaporated material ions, the evaporated material or its evaporative material is bombarded at the same time. The reaction product is evaporated on the substrate.

       According to the vaporization and ionization methods of different membrane materials, different types of ion plating methods can be formed. Membrane vaporization methods include: resistance heating, electron beam heating, plasma electron beam heating, high frequency induction heating, cathode arc discharge heating, etc. The ionization and activation methods of gas molecules or atoms include: glow discharge type, electron beam type, thermionic type, plasma electron beam type, multi-arc and high vacuum arc discharge type, and various forms of ion sources, etc. There are many different combinations of different evaporation sources and different ionization or excitation modes. The most commonly used combinations are:
      1) DC diode type (DC IP). The film is vaporized by resistance or electron beam heating; the plated substrate is used as a cathode, and the charged gas Ar (can also be charged with a small amount of reactive gas) is ionized by high-voltage DC glow discharge. The characteristics of this method are: large substrate temperature rise, good diffraction, good adhesion, poor film structure and morphology, if using electron beam heating, a differential pressure plate must be used; it can be used for plating corrosion-resistant lubricating mechanical products.
      2) Multi-cathode type. Use resistance or electron beam heating to vaporize the film material; rely on thermal electrons, electrons emitted by the cathode and glow discharge to ionize the charged vacuum inert gas or reactive gas. The characteristics of this method are: the temperature rise of the substrate is small, and sometimes the substrate needs to be heated, which can be used for plating precision mechanical products and electronic device decorations.
      3) Active reactive evaporation method (ARE). The film material is vaporized by electron beam heating; the charged oxygen, nitrogen and other reactive gases are ionized by low-pressure plasma glow discharge or secondary electrons between the positive bias probe and the electron beam. The characteristics of this method are: the substrate temperature rise is small, the substrate needs to be heated, the evaporation efficiency is high, and aluminum oxide, titanium nitride, titanium carbide and other thin films can be obtained; it can be used for plating mechanical products, electronic devices, and decorations.
      4) Hollow cathode ion plating (HCD). The membrane material is vaporized by plasma electron beam heating; the charged gas Ar or other inert gas is ionized by the collision of electron beam with low pressure and high current. The characteristics of this method are: the substrate temperature rise is small, the substrate needs to be heated, the ionization rate is high, the electron beam spot is large, and metal film, dielectric film, compound film can be coated; it can be used for decorative coating, wear-resistant coating, mechanical product.
      5) Radio frequency ion plating (RF IP). The film material is vaporized by resistance or electron beam heating; the charged vacuum Ar and other inert gases, reactive gases oxygen and nitrogen are plasmaized by radio frequency plasma discharge. The characteristics of this method are: the temperature rise of the substrate is small, the impure gas is less, the film formation is good, and it is suitable for compound film plating. But matching is more difficult. It can be applied to coating optics, semiconductor devices, decorations, auto parts, etc.
      6) Enhanced ARE type. Heating by electron beam; filling Ar, other inert gas, reactive gas oxygen, nitrogen, etc.; ionization method: In addition to attracting primary electrons and secondary electrons of the electron beam, the low-energy electrons emitted by the enhancer can also promote the gas ionization. The characteristics of this method are: the temperature rise of the substrate is small, and it needs to be added to the substrate; it can be used for plating mechanical products, electronic devices, and decorations.
      7) Low pressure plasma ion plating (LPPD). Use electron beam for heating; rely on plasma to ionize the charged inert gas and the reactive gas. The characteristics of this method are: the substrate temperature rise is small, the substrate needs to be heated, the structure is simple, and the aluminum oxide, titanium nitride, titanium carbide and other plasma compound coatings can be obtained; it can be used for plating mechanical products, electronic devices, and decorations.
      8) Electric field evaporation. Heating with an electron beam relies on the ionization of the metal plasma formed by the electron beam. The characteristics of this method are: the temperature rise of the substrate is small, the substrate needs to be heated, the vacuum evaporation with an electric field, and the coating quality is good; it can be used for the plating of electronic devices and audio devices.
      9) Induction ion heating plating. Heating by high frequency induction; ionization by induction flux leakage. The characteristics of this method are: the temperature rise of the substrate is small, and the compound coating can be obtained; it can be used for mechanical products, electronic devices, and decorations.
      10) Group ion beam plating. Using resistance heating, agglomerates of evaporated particles are ejected from the crucible. Ionization occurs by electron emission or the collision of electrons emitted from the filament. The characteristics of this method are: the temperature rise of the substrate is small, that is, it can be plated with metal films and can be directly plated with compound films, such as zinc oxide, etc.; it can be used for plating electronic devices and audio devices.
      11) Multi-arc ion plating. Heating by cathodic arc light; ionization of reactive gas (or vacuum) by directional motion of evaporating atomic beam. The characteristics of this method are: the substrate temperature rise is large, the ionization rate is high, and the deposition rate is large; it can be used for plating mechanical products, saws, and molds.
       Ion pvd coating machine is widely used in daily applications. Ion coating technology is used for metal plating, watches, watch straps, tableware and other workpieces. It has the advantages of high efficiency, low cost and good wrapping property.