When it comes to the ITO film coated by the ITO vacuum coating machine, you may not know what it is. If there is a see-through touch screen on the screen of the mobile phone, everyone will suddenly realize that the mobile phones we use every day use a kind of ITO film material. , which realizes the effect of perspective and the effect of touch screen. In recent years, mobile phones have been updated and widely used, and almost everyone has one. It can be said that the consumption of ITO film is also huge. Today, the editor of Huicheng Vacuum will tell you about the influencing factors of ITO vacuum coating machine film production:

       The ITO film coated by the ITO vacuum coating machine will have different characteristics during the sputtering process. Sometimes the surface finish is relatively low, and the phenomenon of "pockmarking" occurs. Radiation-type scratches or high-resistance bands, sometimes microcrystalline grooves appear. The production of various properties generally depends on the choice of target and glass, the temperature and motion used during sputtering.
       The current commonly used ITO target is produced by sintering method, that is, indium oxide (In2O3) and tin oxide (SnO2) powder are mixed in a certain proportion, usually the mass ratio is 90% In2O3 and 10% SnO2, and then through a After the series of production processes are processed and formed, they are sintered with oxygen at a high temperature of 1400°C to 1600°C to finally form a black-gray ceramic semiconductor (indium tin oxide, ITO). Generally, the quality of the ITO target can be understood by the appearance. Dark gray is the best. On the contrary, the darker the target, the worse the quality. The quality of the ITO target produced in my country is still black and gray.
       Studies have shown that in the sputtering process of ITO thin film coating by ITO vacuum coating machine, using magnetron sputtering method, the substrate temperature is controlled at about 200 ℃, which can ensure that the resistivity of the thin film is the lowest under the high visible light transmittance of more than 85%. The crystallinity of the film also increases with the increase of the substrate temperature, and the grain size also increases gradually, and the transmittance tends to weaken when the temperature exceeds 200 °C; using the electron beam evaporation method, as the annealing temperature increases, the grain size decreases. When the size becomes larger, the surface morphology is uniform and stable. When the temperature exceeds 600 °C, the particles become different in size and shape, the small particles agglomerate seriously, and the surface morphology of the film is damaged.