The multi-arc ion pvd coating machine uses the method of arc discharge to directly evaporate the metal on the solid cathode target, and the evaporated material is the ions of the cathode material released from the bright spot of the cathode arc, thereby depositing on the surface of the substrate as a method of thin film.

        In order to meet the requirements of coating system and various multi-layer films and composite compound films, multi-functional multi-arc ion plating has become the direction and focus of current research and development. The multi-arc ion coating adopts the advanced technology of twin targets, which overcomes the inherent disadvantages of DC sputtering, such as target poisoning and ignition, and improves the oxidation and corrosion resistance of the plated parts.
      The center of the multi-arc ion coating is to install a cylindrical multi-arc target, and the target material is titanium or zirconium. It can not only maintain the characteristics of high ionization rate and high deposition rate of multi-arc technology, but also effectively reduce the defects of "droplets" that are difficult to avoid during the deposition of facet multi-arc targets, so that low porosity can be prepared. Metal thin film or compound special thin film; twin planar magnetron targets are installed around the periphery, and the target material is aluminum or silicon; at home and abroad, multiple facet multi-arc evaporation sources are installed around the periphery, and the target material is chromium or nickel, which can be plated with multiple layers Metal films and multilayer composite films.
      The pvd coating machine composite ion coating equipment has a variety of different types of coating devices and evaporation sources and emission targets of different materials. They can work independently and simultaneously, and can prepare both pure metal films and metal compound films. Or composite film; it can prepare both single-layer film and multi-layer composite film, which is extremely versatile.