Optical pvd coating machine is widely used in digital technology (imaging, display, circuit, structural decoration), traditional optics, glasses, scientific instruments, optical communication, semiconductors, new energy, etc. Optical pvd coating machine Optical film is based on coating specific film quality on optical components to change the characteristics of light wave transmission and the effect of interference light. High technology changes people's lives, and optical coating equipment is naturally favored by the market. There are broader prospects, so what are the roles of optical films in optical systems? The following is a detailed introduction to the vacuum editor, I hope it can help you:

 1. Improve optical efficiency and reduce stray light, such as mirrors coated with optical films to improve or reduce the reflection effect of light. The high-reflection mirror only takes the reflected light and minimizes the transmitted light; the anti-reflection mirror reduces the emitted light on the surface of the optical components and improves the transmitted light.
2. To realize the adjustment or redistribution of light beam, such as the application of dichroic mirror and beam splitter. Beamsplitters include neutral beamsplitters, dichroic beamsplitters, polarized beamsplitters, etc., which change the transmission, reflection and refraction of light through the characteristics of optical films.
3. Improve the signal-to-noise ratio of the system through the selective transmission of wavelengths, such as band-pass filters and cut-off filters. Bandpass filter refers to a filter with high transmittance in a certain wavelength range and very low transmittance on both sides. A cut-off filter is an optical device that is opaque in a certain wavelength band and has a high transmittance in another adjacent wavelength band.

      Optical thin films can be coated by optical pvd coating machine, and the coating technologies include gaseous film formation and liquid film formation. The gaseous film-forming method can be divided into chemical vapor deposition (CPV) and physical vapor deposition (PVD); the liquid film-forming method can be divided into chemical action or electrochemical action.
      The so-called thin film must control the thickness of the film layer. Generally, the thickness of the film layer can be monitored by visual method (recognized by human eyes), quartz crystal monitoring method (detected by quartz crystal oscillator), optical monitoring method (detected and processed by a complete set of optical systems) ).
      Optical thin film materials: Commonly used optical thin film materials can be divided into oxides, fluorides and alloys in terms of chemical composition. The three materials have their own advantages and disadvantages. Oxides have the characteristics of high melting point, large specific gravity, high mechanical strength and high refractive index, and hard film texture; fluoride has low melting point, small specific gravity, low refractive index, soft film, and fear of water. The characteristics of the alloy; the alloy has strong reflective and light-absorbing properties.