pvd coating machine evaporates aluminum coating, everyone may feel relatively unfamiliar, only the staff who have actually contacted or are engaged in this area may have some relevant knowledge in this area. The following is a small series of vacuum for you to introduce:

In the preparation of pure metal coatings, vacuum evaporation plating is mostly used. The aluminum coating in pure metal is widely used because of its wide range of uses, such as replacing silver with aluminum in the mirror industry, aluminum etching wires in integrated circuits; aluminum plating on the surface of polyacid film to make capacitors; making polyester polyester film aluminum plating , Food flexible packaging to prevent ultraviolet radiation; polyester polyester film is cobalt-plated and then aluminum-plated to make tapes, etc. Therefore, the vacuum aluminum plating industry has not only developed rapidly at home and abroad this year, but also is developing in the field of coating technology such as sputtering and ion plating.
The vacuum evaporation aluminum film can choose intermittent evaporation coating, or semi-continuous pvd coating machine. The evaporation source can be a resistance source, an electron beam source, or an induction heating evaporation source, which can be determined according to the specific requirements of the evaporation film material.
The process parameters of vacuum evaporation aluminum coating mainly include the pressure of the evaporation chamber, the deposition rate, the temperature of the substrate, and the evaporation distance. Considering the uniformity of the distribution on the film substrate, attention should also be paid to the relative position of the evaporation source to the substrate and the motion state of the workpiece holder. For example, when the electron beam evaporation source is used for the preparation of aluminum coating, the typical main process parameters can be selected: the working pressure of the coating chamber is 2.6X10-4Pa, the evaporation rate is 2~2.5nm/s, the substrate temperature is 20℃, the evaporation The distance was 450nm, the electron beam gun voltage was 9kV, and the current was 0.2A.
Experiments show that the film thickness dispersion obtained by electron beam evaporation method is relatively large, that is, the uniformity is poor. This is also one of the reasons why the aluminum film of pvd coating machine has been developed to prepare aluminum film by sputtering and ion plating in recent years.