Everyone knows the vacuum coating machine, and must be familiar with the magnetron sputtering technology, because it involves many industries, and naturally everyone is familiar with it. Today, I will introduce the film thickness uniformity design of the magnetron sputtering vacuum coating machine. Help everyone to have a deeper understanding of the uniformity design of this device.

Thickness uniformity of sputter coating is one of the ultimate criteria for indirectly measuring the coating process, and it involves all aspects of the coating process. Therefore, to prepare high-quality thin films with good film thickness uniformity, it is necessary to establish a comprehensive design system for sputter coating film thickness uniformity, to classify, summarize and summarize all aspects of sputter coating, and to find out their internal connections. Generally speaking, the establishment of a design system should have certain principles to determine its basic organizational framework.
       The following describes its properties from four aspects:
       ①Generality: The system is required to be applicable or ubiquitous within a certain range. For this subject, the system can meet the basic process requirements of sputtering coating on flat substrates in industry, that is, the common problem of sputtering coating process.
       ②Particularity: The system achieves the best applicability to specific research objects. For sputtering coating on large-area flat substrates, the size effect in sputtering coating becomes an important part of the system, such as film uniformity, substrate heating uniformity, linear expansion and deformation of materials, current distribution on the target surface, Gas distribution and electromagnetic field distribution, etc. This series of problems is highlighted by the size effect. The size effect thus becomes a personality issue for the system.
       ③Openness: All parts of the system are organically combined and continuously developed. With the advancement of technology, the functions of each part will inevitably be further developed, thereby improving the overall performance of the system. The development of automatic control technology has made the function of the system powerful: the monitoring technology of the plasma spectrum during the sputtering process and the ability to manipulate the electromagnetic field enable the system to control the parameters of the entire sputtering process to the maximum extent, which can realize fine design. . The openness of the system belongs to horizontal development.
       ④ Inheritance: When the system develops to a certain extent, the process from quantitative change to qualitative change will occur. The system has been continuously improved and improved on the basis of the original functions of Baowang. The thin film preparation technology will gradually deepen with the development of the theory. The theoretical research on non-equilibrium magnetron sputtering and plasma has promoted the further development of sputtering technology. What followed was an upgrade of the system to enable new functionality. Inheritance is the vertical development of a system.
        In general, the enhancement of the function of one part of the system will lead to the enhancement of the overall function, and at the same time reduce the dependence of the system on some parts, or it can be understood that the two necessary factors of the system are organically combined into one part. Establishing a comprehensive design system helps to study the internal logical relationship of each part in the system. The comprehensive design system of large-area sputtering coating can be divided into three parts: T-process design of coating equipment, coating process design and computer numerical simulation design of each process. Each part is divided into thousands of aspects, and the parts affect each other. Because the system is more complex, the establishment of the primary stage of the system should simplify the design parameters as much as possible to improve its practicability.
         After reading the above knowledge of the film thickness uniformity design of the magnetron sputtering vacuum coating machine, do you have a deeper understanding of it? In fact, although we are familiar with the magnetron sputtering technology, we only stay on the superficial surface. A little more professional, we actually know very little. Later, the editor of Huicheng Vacuum will post more professional knowledge in this area for everyone to read.