Multi target ion beam sputtering coating machine is an efficient and pollution-free ion coating equipment, which has the advantages of fast deposition speed, high ionization rate, high ion energy, simple equipment operation, low cost, and large production capacity. Multi target ion beam sputtering coating is widely used in superhard coatings of tools and molds, as well as decorative coatings for golf equipment, watches, bathroom fixtures, lighting fixtures, glasses and frames, hardware products, ceramics and glass, and other fields.

The multi target ion beam sputtering coating machine is a modern coating equipment that integrates optics and mechanics to study the surface modification of high-quality thin films and materials such as superconductivity, diamond like, optics, and magnetism. The machine adopts four targets, dual ion source, and ion source as Kauffman source. The principle is to use a positive ion beam or neutral particle with 1500ev energy to bombard the target material, causing atoms and molecules on the surface of the material to sputter out from the base material and deposit on the substrate to form a film. Can be plated with any material, including metals, alloys, superconductors, semiconductors, insulators, etc.

This machine adopts ion beam sputtering technology, which was just developed in the 1980s. It uses a dual ion source and a main gun to bombard the target material, while the auxiliary gun cleans the substrate before plating, enhancing the activity of the substrate, improving adhesion and purity. Low energy bombards the film during deposition, enhances the surface diffusion and migration of deposited atoms, reduces the defects of film crystal junction, and is equipped with various functions for substrate processing, such as heating, cooling, rotation, laser processing, mask, etc. Outgoing grid φ 25mm ion energy, 1500ev energy beam current greater than 80mA.

The multi target ion beam sputtering coating machine system is in a leading position in high-precision optical thin film deposition applications. The multi target ion beam sputtering coating machine is the only existing system that can interchangeably use planetary, simple rotating, or reversible substrate devices in the same system. In communication applications, DWDM filters with narrow passband, wide cutoff band, high isolation, and low insertion loss characteristics can be used to deposit high output 200100 and 50GHz, meeting the strictest performance indicators. In other high-precision optical applications, multi target ion beam sputtering coating can be used for depositing antireflective films, complex non quarter wavelength film layers, and ultra-low loss laser mirrors with absorption and scattering below millionths.