The Magnetron sputtering coating technology of vacuum coating machine has been widely used in all walks of life, and is favored by many coating manufacturers. However, most of the departments still have a simple understanding of the coating principle of Magnetron sputtering vacuum coating machine. The following is a summary of the vacuum series to introduce the coating principle of Magnetron sputtering coating equipment, hoping to help everyone:

vacuum coating machine uses Magnetron sputtering coating target source. Whether it is unbalanced or balanced Magnetron sputtering coating target source, if it is a static magnet, the utilization rate of magnetic field power to materials will be less than 30%. Generally, small coating equipment often uses magnetic field stationary targets. In view of this, the use of target materials can be increased by changing the magnetic field. The rotating magnetic field is used for large equipment and valuable targets.
In general, Magnetron sputtering technology uses the interaction of electrons and magnetic fields to generate a large number of ions to hit the target to complete the target sputtering, which can not be separated from the participation of inert gases. In today's Magnetron sputtering equipment, the coil magnet has been replaced by a more efficient permanent magnet.
A good Magnetron sputtering coating equipment costs a lot. The target source is equivalent to the heart of the coating equipment, but it is often ignored by buyers. Many friends pay attention to the measurement of the film thickness, the quality of the matching vacuum pump, and whether the MFC program is easy to use. In other aspects, such as the lack of strength of the heart, it has a great impact on the overall effect. The cooling of the source is necessary to ensure that the source is not damaged by high temperatures.
Magnetron sputtering can be divided into medium frequency, high frequency and DC. The principle of medium frequency Magnetron sputtering is the same as that of DC Magnetron sputtering. In the Magnetron sputtering coating of the whole system, the cylinder is related to the arrangement of cathode and anode. The difference is that the anode of DC Magnetron sputtering is a cylinder, while the medium frequency Magnetron sputtering appears in pairs. As far as intermediate frequency Magnetron sputtering is concerned, products plated with some metals are mostly used nowadays. This equipment is generally made in a large scale, which can put down a lot of products for plating together, improving efficiency and film density.
Different ion densities can be obtained by using different Magnetron sputtering coating technologies. Changing the design of the magnetic field can change the amount and distribution of ions. For Magnetron sputtering technology, the magnetic field is confidential. It is worth noting that pulse reactive Magnetron sputtering has begun to be widely used internationally, especially in European coating companies.
The manufacturers of vacuum coating machine are trying to improve the quality of the film, including coating speed, adhesion, uniformity, etc; Many new technologies and methods have emerged for the issue of film adhesion, including bipolar pulse cleaning, high-pressure cleaning, etc., which can improve the polishing and cleaning effect of products before coating. In recent years, the rapid development of filtered cathode arc technology has also to some extent improved the problem of uneven film layers.