At present, the most commonly used coating technologies on the market are evaporation coating, multi arc ion coating, magnetron sputtering coating, etc. Evaporation coating and magnetron sputtering coating are more widely used. Below, the vacuum editor will explain the areas of vacuum coating machine evaporation coating and magnetron sputtering coating:

Evaporation Heating The free radicals or ions on the target surface are evaporated, and then processed on the substrate surface. The film forming process (scattering island structure of Vagus nerve nerve structure layer growth) forms a film.

The uniformity of evaporation coating components is not easy to ensure and can be controlled by specific factors. However, due to limited principles, the uniformity of evaporation coating components is not good for non single component coatings. Sputtering can be simply understood as the use of electrons or high-energy lasers to bombard targets, resulting in the sputtering of surface components in the form of free radicals or ions, and deposition on the substrate surface during the film-forming process, ultimately forming a thin film. The equipment sputtering of vacuum coating machines is divided into many types, and evaporation will become a major parameter at different sputtering rates.

The composition uniformity of the laser sputtered PLD coating is easy to maintain, and the thickness uniformity at the atomic scale is poor (due to pulse sputtering). The control of crystal orientation (external) growth is also more general.