Magnetron sputtering pvd coating machine is currently the most widely used coating equipment and technology in daily life. As we all know, there are many types of pvd coating machines that are applied to different industries, and the types are different. However, almost every industry that uses coating technology will apply to magnetron sputtering coating technology. The machines used are naturally magnetron sputtering vacuum coating machines, So what are the characteristics of magnetron sputtering vacuum coating technology? Below is a detailed introduction by the vacuum editor:

The technology of magnetron sputtering vacuum coating machine is to conduct high-speed sputtering at Low-pressure area, and the ionization rate of gas must be effectively improved. A method of increasing plasma density and sputtering rate by introducing a magnetic field on the surface of the target cathode and utilizing the magnetic field to constrain charged particles. Magnetron sputtering includes many types. Each has different working principles and application objects. But there is one thing in common: using the interaction between magnetic field and electric field, electrons move in a spiral shape near the target surface, thereby increasing the probability of electrons colliding with argon to produce ions. The ions generated collide with the target surface under the action of an electric field, thereby splashing out of the target material.
The magnetron sputtering pvd coating machine has the following characteristics: thin film layer, high purity sputtering film, and mixing of crucible heater materials. The adhesion between the magnetron sputtering vacuum coating machine and the substrate, as well as the high-energy representation of the sputtered atoms, undergoes varying degrees of writing. A part of the sputtered layer is formed in a pseudo dispersed layer where the substrate and substrate atoms merge with each other; Downward special materials can be used as thin films, which can combine different mixed materials prepared by sputtering at the same time.
The magnetron sputtering pvd coating machine can also produce TiN, a gold like film by sputtering; The controllability and repeatability of the film thickness are good. The magnetron sputtering vacuum coating machine can reliably set the thickness of the coating system, and the sputtering coating machine can obtain a larger thickness of the film layer on the surface.
The zigzag shape of the coating target in the magnetron sputtering pvd coating machine is used for static electromagnetic fields, uniform electric fields, and separate applications of electric fields in planar and coaxial cylindrical targets. Under the effect of the electric field of electrons, the velocity flies to the substrate and collides with argon atoms. If the electrons have sufficient energy (about 30ev), ionize Ar+and generate electrons, the electrons fly to the substrate. Under the effect of the electric field of Ar+, the velocity of the cathode sputtering target flies, and high-energy bombardment hits the surface of the target, resulting in the sputtering of target data.