When it comes to ITO pvd coating machine for ITO thin film coating, you may not know what it is. If there is a touch screen with perspective on the phone screen, you will suddenly realize that the phones we use today are all made of an ITO thin film material, which achieves both perspective and touch screen effects. In recent years, mobile phones have been updated and widely used, with almost every person having one. The consumption of ITO film can be said to be huge. Today, Huicheng Vacuum Editor is going to talk to you about the influencing factors of ITO vacuum coating machine film production:

The ITO pvd coating machine produces different characteristics during the sputtering process of ITO thin films. Sometimes, the surface finish is relatively low, and there are "pitting" phenomena. Sometimes, there are high corrosion intervals. During etching, there are also linear radial scratches or high resistance bands, and sometimes microcrystalline grooves. The generation of various characteristics generally depends on the selection of target materials and glass, as well as the temperature and movement method used during sputtering.

The commonly used ITO target material is produced through sintering method, which is a mixture of indium oxide (In2O3) and tin oxide (SnO2) powder in a certain proportion, usually with a mass ratio of 90% In2O3 and 10% SnO2. After being processed and formed through a series of production processes, it is sintered with oxygen at high temperatures ranging from 1400 ℃ to 1600 ℃ to form a black gray ceramic semiconductor (indium tin oxide, ITO). The quality of ITO targets can generally be understood through their appearance, with dark gray being the best. On the contrary, the darker the color, the worse the quality. The quality of ITO targets produced in China is still acceptable, with black gray being the best.

Research has shown that during the sputtering process of ITO thin films deposited on the ITO pvd coating machine, magnetron sputtering is used, and the substrate temperature is controlled at around 200 ℃ to ensure that the film has a high visible light transmittance of over 85%, with the lowest resistivity. The crystallinity of the film also increases with the increase of substrate temperature, and the grain size gradually increases. After exceeding 200 ℃, the transmittance tends to decrease; By using electron beam evaporation plating, as the annealing temperature increases, the grain size becomes larger and the surface morphology becomes uniform and stable. After exceeding 600 ℃, the particles become of different sizes and shapes, and the phenomenon of small particle aggregation is severe, resulting in damage to the surface morphology of the thin film.