The PVD decorative film plating process for metal parts of Pvd Coating Machine is mainly used in the design of decorative products. For example, large sheet metal pipes, furniture and decorations are coated with protective film, and the products coated with Pvd Coating Machine can exhibit various beautiful effects such as elegance and brilliance, and the film layer is wear-resistant and does not fade.

1. Decorative material (substrate)
(1) Metal. Stainless steel, steel based alloys, zinc based alloys, etc.
(2) Glass, ceramics.
(3) Plastic. ABS, PVC, PC, SHEET, nylon, crystal, etc.
(4) Flexible materials. Polyester film, PC, paper, cloth, foam plastic, steel strip, etc.
2. Types of decorative films
(1) Metal substrate decorative film layers: TiN, ZrN, TiC, CrNx, TiCN, CrCN, Ti02, Al, etc.
(2) Glass and ceramic decorative film layers: TiO2, Cr2O3, MgF2, ZnS, etc.
(3) Plastic substrate decorative film layers: AI, Cu, Ni, SiO2, TiO2, ITO, MgF2.
(4) Flexible material decorative film layers: Al, lTO, TiO2, ZnS, etc.
The Pvd Coating Machine uses magnetron sputtering ion plating technology to prepare ZrN film for brass plated bright chromium sanitary ware. The Pvd Coating Machine adopts a unbalanced magnetron sputtering target with zirconium as the substrate, an intermediate frequency power supply, and a pulse bias power supply.
(1) Vacuuming
5 X 10-3~6.6 x 10-13Pa background vacuum. The heating temperature of the vacuum coating equipment should rise again to 100-150 ℃ after the vacuum chamber wall is deflated.
(2) Bombardment cleaning
Vacuum degree: The argon vacuum degree of Tongren is maintained at 2-3Pa. Bombardment voltage: 800-1000V, pulse duty cycle 20%. Bombardment time: 10 minutes.
(3) Coating
① Deposited zirconium substrate
Vacuum degree: Inject argon gas and maintain the vacuum degree at s x l0-1Pa. Target voltage: 400-550V, target power: 15N 30W/Crrr2. Pulse bias voltage: 450-500V, duty cycle 20%. Coating time: 5-10 minutes.
② Plating ZrN film
Vacuum degree: Inject nitrogen gas and maintain the vacuum degree at (3-5) x 10-1Pa. Target voltage: 400-550V, target current increases with the increase of target area. Pulse bias voltage: 150-200V, duty cycle 80%. Coating time: 20-30 minutes.
Due to the low metal ionization rate in magnetron sputtering technology of Pvd Coating Machine, it is not easy to undergo reactive deposition, and the process range for obtaining compound film layers is relatively narrow. The Pvd Coating Machine can use a gas ion source to ionize the reaction gas, expanding the process range of reaction deposition. The arc plasma generated by a cylindrical arc source can also be used as the ionization source, and the cylindrical arc source is still an auxiliary coating source.