pvd coating machine is widely used in all walks of life, such as furniture, tableware, decorations, hardware, electronic products, glass, military products, etc., then plating products in different fields, the effect is not the same, so the coating process is not the same.

The application of a pvd coating machine coating is simply understood as the coating of a metal film or coating on metal, glass, ceramic, semiconductor and plastic components by evaporation, sputtering and subsequent condensation in a vacuum environment. Compared with the traditional coating method, vacuum coating is a dry coating, the main methods include the following, vacuum evaporation. The principle is that under vacuum conditions, the evaporating material is heated by the evaporator to evaporate or sublimate, and the evaporated ion flow is directly directed to the substrate, and a solid film is deposited on the substrate, and the sputtering coating is a 2000 volt high voltage connected to the cathode under vacuum conditions to stimulate glow discharge. Positively charged argon ions hit the cathode to eject atoms, and the sputtered atoms are deposited on the substrate through an inert atmosphere to form a thin film layer. Ion plating. That is, dry screw vacuum pump manufacturers have introduced vacuum ion plating. It is in both of the above
The pvd coating machine is developed on the basis of coating technology, so it has two technical characteristics. Under vacuum conditions, the working gas or evaporating substance (thin film material) is partially ionized by gas discharge, and the evaporating substance or its reactants are deposited on the substrate surface under ion bombardment. In the film forming process, the substrate is always bombarded by high-energy particles and is very clean.
pvd coating machine coating is a continuous coating technology on a flexible substrate by physical vapor deposition to achieve some functions and decorative properties of the flexible substrate. The above four types belong to the application of physical vapor deposition technology (PVD). Then there is chemical vapor deposition (CVD). The film is made by chemical reaction. The principle is that at a certain temperature, the reaction gas containing the film-forming material is introduced into the substrate and adsorbed, a chemical reaction is generated on the substrate to form a nucleus, and then the reaction product is separated from the surface of the substrate and continuously diffused to form a film. Ion beam deposition coating, which combines ion implantation and gas phase deposition technology, is a technique that uses ionized particles as vapor deposition materials to form films with good properties at relatively low substrate temperatures.