pvd coating machine coating materials are mainly used to prepare various thin film materials with specific functions. Application areas include flat panel displays, semiconductors, solar cells, opto-magnetic recording media, optical components, energy-saving glass, LED, tool modification, and high-end decorative products. wait.

Thin film materials grow on substrate materials (such as screen display glass, optical glass, etc.). They are generally formed by coating materials such as metals, non-metals, alloys or compounds, and have the functions of anti-reflection, absorption, cut-off, light splitting, reflection and filtering. , interference, protection, waterproof and anti-fouling, anti-static, electrical conductivity, magnetic conductivity, insulation, wear resistance, high temperature resistance, corrosion resistance, anti-oxidation, radiation protection, decoration and composite functions, and can improve product quality, environmental protection, energy saving , extend product life, improve original performance, etc. At present, thin film material preparation technologies mainly include: physical vapor deposition (PVD) technology and chemical vapor deposition (CVD) technology.
        1. Sputtering coating refers to the use of ions generated by an ion source to accelerate and gather in a vacuum to form a high-speed ion beam that bombards the solid surface. The ions and the atoms on the solid surface exchange kinetic energy, causing the atoms on the solid surface to leave the solid. and deposited on the surface of the substrate material. The solid being bombarded is the raw material for depositing thin film materials by sputtering, and is called a sputtering target.
        Generally speaking, a sputtering target is mainly composed of a target blank, a back plate (or back tube) and other parts. The target blank is the target material bombarded by high-speed ion beams and is the core part of the sputtering target. During sputtering During the coating process, after the target blank is hit by ions, the atoms on its surface are sputtered out and deposited on the substrate to form a thin film material. Since the sputtering target needs to be installed in a special equipment to complete the sputtering process, the inside of the equipment is high. Voltage and high vacuum working environment, most target blanks are made of soft or highly brittle materials and are not suitable for direct installation in the equipment. Therefore, they need to be bound to the back plate (or back tube). The back plate (or back tube) is mainly It plays the role of fixing the sputtering target and has good electrical and thermal conductivity.
        The sputtering coating process has good repeatability, controllable film thickness, and can obtain a thin film with uniform thickness on a large area of substrate material. The prepared film has the advantages of high purity, good compactness, and strong bonding with the substrate material. It has been It has become one of the main technologies for preparing thin film materials. Various types of sputtered thin film materials have been widely used. Therefore, the demand for sputtering targets, functional materials with high added value, is increasing year by year, and sputtering targets have also been It has become the most widely used PVD coating material in the market.
       2. Vacuum evaporation coating refers to a deposition technology that uses the thermal energy of a film heating device (called an evaporation source) to evaporate a certain substance by heating and deposit it on the surface of the substrate material under vacuum conditions. The evaporated substance is the raw material for depositing thin film materials using vacuum evaporation coating method, which is called evaporation material.
       The vacuum evaporation coating system generally consists of three parts: vacuum chamber, evaporation source or evaporation heating device, substrate placement and substrate heating device. In order to evaporate the material to be deposited in a vacuum, a container is required to support or contain the evaporated material, and at the same time, it is necessary to provide evaporation heat to bring the evaporated material to a high enough temperature to generate the required vapor pressure.
       The coating technology of evaporative pvd coating machine has the characteristics of simplicity, convenience, easy operation, and fast film formation speed. It is a widely used coating technology and is mainly used for coating small-sized substrate materials.