The high-precision electron beam evaporation coating machine uses the method of e-book bombardment to heat and evaporate materials under high vacuum conditions to plate various metals, oxides, conductive films, optical films, semiconductor films, conductive films, optical films, etc. on the substrate. Thin films, semiconductor films, ferroelectric films, superhard films, etc. can be plated into mixed single-layer films, multi-layer films or doped films, and various high melting point materials can be plated.

A precision vacuum coating machine that forms high-precision optical multi-layer films on glass/PC/PMMA substrates; by combining a variety of components that meet customer needs, a film with better quality can be formed; the substrate umbrella frame adopts a central rotation method ( revolution), reducing vibration and particles, allowing the substrate to rotate stably.
Using the electron beam heating method without pole pieces on the crucible as the evaporation source, multi-layer films can be formed stably; using the company's unique ratio control method and multi-point online monitoring, high-precision and stable optical multi-layer films can be formed; A lift with good operability can be used to take out the substrate umbrella frame.
It uses an ion source with evenly distributed high ion current density and is equipped with a dual electron gun. The multi-point and ring-type crucible can be plated with more than 100 layers. The automatic evaporation control system is used to realize a fully automatic evaporation process. The workpiece holder can be selected from the bell jar type or planetary type. Mode.
AR film (substrate glass transmittance >91.5%): 1. 420-680nm band, single-sided average transmittance >95%, reflectivity less than 0.5 (average)%; 2. Double-sided average transmittance > 98%, reflectivity less than 0.5 (average)%;
AS/AF film test standards: 1. Initial contact angle range is 115±5°; 2. Steel wool friction resistance test standards: use 0000# steel wool, area 10*10mm, stroke 40 times/min, load 1Kg, 5000 After 2500 times of back-and-forth friction, the contact angle is greater than 100°; 3. Eraser test standard: 6mm diameter eraser, 25 strokes/min, load 1Kg, after 2500 times of back-and-forth friction, the contact angle is greater than 100°;
Note: The test sample glass must be precision-polished touch screen cover glass with a smooth surface.
The advantages of high-precision electron beam evaporation coating machines are threefold: increasing deposition rates to achieve higher yields, achieving high-precision processes in the fields of semiconductors, optoelectronics and photonics, being rugged and easy to maintain