Magnetron sputtering pvd coating machine is the most widely used coating equipment and technology in daily life. Everyone knows that vacuum coating machine is also divided into many types, which are applied to different industries, and the types are different, but almost every industry uses coating technology. , will be applied to the magnetron sputtering coating technology, the machine used is naturally the magnetron sputtering vacuum coating machine, so what are the characteristics of the magnetron sputtering pvd coating machine coating technology? The following is a detailed introduction to the vacuum editor:

      The magnetron sputtering pvd coating machine coating technology is to perform high-speed sputtering under low pressure, and the ionization rate of the gas must be effectively improved. By introducing a magnetic field on the surface of the target cathode, the confinement of the charged particles by the magnetic field is used to increase the plasma density to increase the sputtering rate. There are many types of magnetron sputtering. Each has different working principles and application objects. But they have one thing in common: the interaction of the magnetic field and the electric field causes the electrons to spiral around the target surface, thereby increasing the probability of the electrons hitting the argon gas to produce ions. The generated ions hit the target surface under the action of an electric field to sputter out the target.
      Magnetron sputtering pvd coating machine coating has the following characteristics: thin film layer, high-purity sputtering film is not mixed in the material composition of the crucible heater. The adhesion of magnetron sputtering vacuum coater to the substrate, and the high energy appearance of sputtered atoms, write to different degrees, and a part of the sputtered layer is formed on the substrate and the substrate atoms merge with each other Pseudo-dispersion layer; downstream special materials can be so thin films that can be combined with different materials prepared by sputtering at the same time.
      Magnetron sputtering pvd coating machine coating can also be sputtered into TiN, imitation gold film; film thickness controllability and repeatability are good, magnetron sputtering vacuum coating machine coating can reliably set the coating film of the system thickness, and sputter coaters coat the surface of thin film layers that can achieve greater thicknesses.
      In the meandering shape of the coating target of the magnetron sputtering pvd coating machine, the static electromagnetic field, the uniform electric field of the magnetic field, and the electric field are used separately in the plane target and the coaxial cylindrical target. Under the effect of the electric field of the electrons, the speed of flying to the substrate and the collision of the argon atoms, if the electrons have sufficient energy (about 30ev), ionized Ar+, and electrons are generated, and the electrons fly into the substrate, the effect of the electric field of Ar+ Under, the speed of the cathode sputtering target is flying) and the surface of the target is bombarded with high energy, so that the sputtering target material.