The magnetron sputtering coating technology of pvd coating machine has been widely used in all walks of life and is favored by many coating manufacturers, but most of them have a very shallow understanding of the coating principle of magnetron sputtering pvd coating machine. Sort out some introductions about the coating principles of magnetron sputtering coating equipment, hoping to help you:

       The pvd coating machine uses a magnetron sputtering coating target source, whether it is an unbalanced or balanced magnetron sputtering coating target source, if it is a static magnet, the magnetic field power generated by the material will be less than 30%. The general small coating equipment mostly uses the magnetic field static target. In view of this, the utilization of the target can be increased by changing the magnetic field, and the rotating magnetic field is used on large equipment and precious targets.
       Generally speaking, magnetron sputtering technology uses the interaction of electrons and magnetic fields to generate a large number of ions to hit the target to complete the sputtering of the target, which is inseparable from the participation of inert gas, which has been eliminated in today's magnetron sputtering equipment The coiled magnets are replaced with higher efficiency permanent magnets.
       A good magnetron sputtering coating equipment is very expensive. The target source is equivalent to the heart of the coating equipment, but it is often overlooked by buyers. Many friends pay attention to the measurement of the film thickness, the quality of the matching vacuum pump, and whether the MFC program is easy to use. , In other respects, such as the heart is not strong enough to have a great impact on the overall effect, the cooling of the source is a must configuration to ensure that the source is not damaged by high temperature.
       Magnetron sputtering can be divided into intermediate frequency, high frequency and direct current. The principle of intermediate frequency magnetron sputtering is the same as that of direct current magnetron sputtering. In the magnetron sputtering coating of the whole system, the arrangement of the cylinder, the cathode and the anode The difference is that the anode of DC magnetron sputtering is a cylinder, while the intermediate frequency magnetron sputtering occurs in pairs. As far as intermediate frequency magnetron sputtering is concerned, products that are plated with some metals are mostly used today. This kind of equipment is generally produced in a relatively large size and can be plated together with a lot of products, which improves the efficiency and the compactness of the film layer. .
       Different ion densities can be obtained by using different magnetron sputtering coating techniques. Changing the design of the magnetic field can change the amount and distribution of ions. For magnetron sputtering technology, the magnetic field is confidential. It is worth noting that the magnetron sputtering of pulse reaction has begun to be applied on a large scale in the world, especially in European coating companies.
       Manufacturers of pvd coating machine are striving to improve the quality of the film, including coating speed, adhesion, uniformity, etc.; for the problem of film adhesion, many new technologies have emerged one after another, including bipolar pulse cleaning, high pressure Cleaning, etc., can improve the effect of polishing and cleaning before product coating. In recent years, the rapid development of cathodic arc filtration technology has also improved the problem of non-uniformity of the membrane layer to a certain extent.