PVD coating, also known as "physical vapor deposition coating", this coating process has a wide range of applications and small limitations, but not many people really understand it, and even fewer know about pvd coating machine. Cheng vacuum editor will give you a detailed introduction, I hope it can help you:

There are three major categories of PVD coating: vacuum sputtering coating, vacuum ion coating, and vacuum evaporation coating.
       Equipment used for PVD coating: usually called PVD vacuum coating equipment or PVD coating machine
       Principle of PVD coating: In a vacuum environment, arc discharge technology with low voltage and high current is used, and the coating material is deposited on the surface of the product to be plated by heating the evaporation source or by using glow discharge and ion bombardment.

       The films that PVD coating can coat: it can coat various single metal films (gold, silver, aluminum, zinc, titanium, etc.), oxide films (TiO, etc.), carbide films (TiC, TiCN, etc.) etc.), nitride film (TiN, CrN, TiAiN, etc.), the color of the film can be single color or seven colors can be plated. The thickness of the film layer is micron level, and the thickness of the vacuum coating is relatively thin, and the plated film layer hardly affects the size of the product.

       Vacuum sputtering coating:
       The basis of sputtering technology in glow discharge, sputtering is generally produced in the process of glow discharge. Sputtering bombards the solid surface with particles or ion beams with high kinetic energy, so that atoms close to the solid surface can obtain incident particles. Therefore, a portion of the energy is taken off the solid into the vacuum and deposited on the product.
       Factors affecting the sputtering effect: 1. Target; 2. Mass of bombarding ions; 3. Energy of bombarding ions; 4. Incident angle of bombarding atoms.

       Vacuum ion coating:
       Ion plating is a new coating technology based on evaporation plating and sputtering plating. The vacuum PVD coating process is all carried out in plasma. Ion plating can obtain a film with excellent performance. Its film features:
       1. The surface finish is good, and the thickness of the deposition can be strictly controlled;
       2. The film has strong adhesion and high binding force;
       3. The thickness of the film layer is uniform and there is no boundary effect;
       4. The density of the film layer is high.

       Vacuum evaporation coating:
       In a vacuum chamber, the film raw material of the evaporation source is heated to form a method in which atomic or molecular vapor streams are incident on the surface of the product and condense to form a solid film.
       Advantages: The evaporation equipment is cheap, the operation is simple, the film forming rate is fast, the plated film has high purity, good quality and can control the thickness;
       Disadvantages: The adhesion of the film layer is low, the process repeatability is not good enough, and it is not easy to obtain a thin film layer with a crystalline structure.
       For these three PVD coating processes, different products need to choose different processes and configure special equipment. pvd coating machine is composed of vacuum chamber, power supply system, control system, cooling system, vacuum acquisition system and components, and the price varies.