The PVD decorative film coating process for metal parts of vacuum coating machine is mainly designed for decorative products. For example, large-scale sheet pipes, furniture and decorations are coated with protective film, and the products coated by vacuum coating machine can show various beautiful effects such as grace, luxury and dazzling, and the film is wear-resistant and does not fade.
1. Decoration material (substrate)
(1) Metal. Stainless steel, steel-based alloy, zinc-based alloy, etc.
(2) Glass and ceramics.
(3) Plastic. ABS, PVC, PC, SHEET, nylon, crystal, etc.
(4) Flexible materials. Polyester film, PC, paper, cloth, foam, steel belt, etc.
2. Types of decorative film
(1) Decorative film layer of metal substrate: TiN, ZrN, TiC, CrNx, TiCN, CrCN, Ti02, Al, etc.
(2) Glass and ceramic decorative film: TiO2, Cr2O3, MgF2, ZnS, etc.
(3) Plastic base material decorative film layer: AI, Cu, Ni, Si02, Ti02, ITO, MgF2.
(4) Decorative film layers of flexible materials: Al, lTO, TiO2, ZnS, etc.
The vacuum coating machine uses magnetron sputtering ion plating technology to plate ZrN film for brass electroplated bright chrome sanitary ware. The vacuum coating machine adopts an unbalanced magnetron sputtering target with a base material of zirconium, an intermediate frequency power supply, and a pulse bias power supply.
(1) Vacuum
5 X 10-3~6.6 x 10-13Pa background vacuum. The heating temperature of the vacuum coating machine should rise to 100~150℃ after venting the wall of the vacuum chamber.
(2) Bombardment cleaning
Vacuum degree: The vacuum degree of argon gas is maintained at 2~3Pa. Bombardment voltage: 800~1000V, pulse duty ratio 20%. Bombardment time: 10min.
(3) Coating
① Deposited zirconium bottom layer
Vacuum degree: argon gas is introduced, and the vacuum degree is maintained at s x 10-1Pa. Target voltage: 400-550V, target power 15 N 30W/Crrr2. Pulse bias: 450~500V, duty cycle 20%. Coating time: 5~10min.
②ZrN coating
Vacuum degree: pass in nitrogen and keep the vacuum degree at (3~5) x 10-1Pa. Target voltage: 400~550V, the target current increases as the area of the target increases. Pulse bias voltage: 150~200V, duty ratio 80%. Coating time: 20~30min.
Due to the low metal ionization rate in the magnetron sputtering technology of the vacuum coater, reactive deposition is not easy, and the process range for obtaining the compound film is relatively narrow. The
vacuum coating machine can use a gas ion source to ionize the reaction gas and expand the process range of reactive deposition. Arc plasma generated by a cylindrical arc source can also be used as an ionization source, and the cylindrical arc source is also an auxiliary coating source.