Magnetron sputtering vacuum coating machines are widely used in daily life and are also very popular in the market. Therefore, everyone pays special attention to issues related to the coating technology of magnetron sputtering vacuum coating machines. Today, the editor of Huicheng Vacuum will introduce to you the impact of magnetron sputtering vacuum coating machines. What are the main parameters of sputtering vacuum coating machine?

1. Sputtering threshold:
The minimum energy value of incident ions required to sputter out target atoms. It has little to do with the type of incident ions and everything to do with the target material. After the amount of energetic ions exceeds the sputtering threshold, as the ion energy increases, before 150ev, the sputtering yield is proportional to the square of the ion energy; in the range of 150ev~1kev, the sputtering yield is proportional to the ion energy; In the range of 1kev~10kev, the sputtering yield does not change significantly; as the energy increases, the sputtering yield shows a downward trend. Below are the sputtering thresholds for several metals bombarded with different incident ions.
2. Sputtering output:
When incident ions bombard the target, the average number of atoms each positive ion can be ejected from the target. The influencing factors mainly include the following aspects:
1. The sputtering yield shows a certain periodicity with the change of the atomic number of the target. As the filling degree of the d-shell electrons of the target atoms increases, the sputtering yield becomes larger (rough change trend).
2. Effect of incident ion species on sputtering yield
The sputtering yield increases periodically with the incident atomic number.
Sputtering yields of silver, copper and tantalum corresponding to various incident ions of 45Kev
3. Effect of ion incident angle on sputtering yield
For the same target material and incident ions, the sputtering yield increases with the increase of the ion incident angle. When the angle increases to 70⁰~80⁰, the sputtering yield is maximum. As the incident angle continues to increase, the sputtering yield decreases sharply, reaching zero at 90⁰.
4. Effect of target temperature on sputtering yield
Generally speaking, within a certain temperature range where the sputtering yield can be considered to be closely related to the sublimation energy, the sputtering yield hardly changes with the change of temperature. When the temperature exceeds this range, the sputtering yield tends to increase sharply.
The above two major points are the parameters that most affect the sputtering of the magnetron sputtering vacuum coating machine. Changes in these two parameters directly involve the adhesion and structure of the film layer and other characteristics. Therefore, the parameters of sputtering Extremely important.