High performance RF ion source with ion assisted evaporation RF ion source

HC-Rf I ion assisted deposition (IAD) and cleaning are the most suitable ion beam assisted deposition (IAD) sources with high performance. Mounted on the vacuum coating machine, it is most suitable for mass production of various optical filters.

HC-Rf Ⅱ plus is an extension of OIS two. In the aspect of large current and large area performance of ion assisted evaporation, RF ion source is evolved to optimize maintenance performance and neutralizer, so as to improve cooling efficiency to achieve stable production. It is suitable for ion beam assisted deposition (IAD) and cleaning at high rate. It can be used in mass production of various optical filters.

It can be used in inert and reactive environment, with a working current of 90mA and a working voltage of 3000V. Although the grid aperture is only 10cm, the design fully considers the high current density and uniformity. It is installed in the film-forming machine to fully illuminate the workpiece frame, which is most suitable for the medium-scale mass production, trial production, research and development of various optical filters.

Applications include semiconductor, substrate pre-cleaning, ion assisted (ITO and Ag assisted deposition), etching / nano texture / coating removal, pacvd-dlc deposition and ion beam deposition.