HCMS series

Magnetron sputtering

optical coating machine

Vacuum Application Solution Supplier
Home > Product > Magnetron sputtering optical coating machine
Magnetron sputtering optical coating machine

Compared with the ordinary plane target device in the industry, the service cycle and utilization efficiency of the target material of the rotating cathode device are significantly improved; the customized structure of the base plate workpiece frame can provide the maximum utilization space for the customer's product placement; the fully automatic lifting and lifting frame device can greatly reduce the opening and closing time of the machine and greatly improve the production efficiency and process stability; the patent separation The sub source has the characteristics of wide energy balance, high isolation rate, super stable working efficiency and low energy consumption.

It can use time to precisely control the film thickness, meet the design process requirements, save crystal control and optical control links, and save a large number of film thickness instrument consumables for customers; it can produce high refractive index nitriding film, improve the film hardness performance; it can be used for various purposes at low temperature; it can automatically adjust the gas flow patent device, maintain a stable target voltage, and ensure the film quality; optional "correction plate" External adjustment mechanism ".

The sputtering deposition system is equipped with a plurality of cylindrical targets on the side wall to improve the deposition rate and multilayer coating. The system is equipped with a DC pulse or RF power circular cathode. The vertically mounted substrate and cylindrical cathode can minimize the particle pollution in the coating process.

AR ilm (substrate glass transmittance > 91.5%):
■  In 420-680nm band, the average transmittance of one side is more than 95%, and the reflectivity is less than 0.5 (average);
■  The average transmittance on both sides is more than 98%, and the reflectivity is less than 0.5 (average);

Color film or gradient film:
■  According to the customer's sample, five furnaces are loaded at random or full, and the color difference Δ E & lt; 1.2;
■  Boiling test: boiling at 80 ℃ for 30min, 3M after 100 grid test (1 * 1mm), it is more than 4B.

Product Advantage.

HCMS series magnetron sputtering optical coating machine includes the following key capabilities:
  • Compact

    Small footprint, easy to integrate into the factory

  • Patented

    Huicheng independent research and development ion source

  • Accurate

    Accurate monitoring of film thickness

  • Low temperature

    Film formation at low temperature less than 70 ℃

  • Automation

    Automatic regulation of gas flow

  • Simple

    Easy to operate and maintain

Mode HCSO-2100
Coating area Φ2100x H1200mm
Structure Vertical single door, All-In- One Box layout
Wavelength 380nm~780nm
Rotational speed 0~25RPM(variable)
Coating chamber pumping speed 4.0×10-3Pa≤30min
Ultimate vacuum 5.0×10-4Pa
Sputtering target Nb,Si,Cr,Al,In ...
Jig Unit Center Rotation Jig at the bottom
Vacuum Unit Low Vacuum Pump + High Vacuum Pump + Cryogenic Pump
Vacuum Controller Vacuum Controller, Penning Gauge, Pirani Gauge
Coating Unit DC + MF Magnetron Sputtering Source + Plasma Source
Charge Unit MFC + speedflo pressure controller
Thickness Controller Crystal Controller
Controller Industrial PC + TP
Application AR, Hard AR Coating, Hard Coating, Decorative Coating, HR Coating, etc.
Remark: Customization

Application cases.

Digital technology (imaging, display, circuit, structural decoration), traditional optics, glasses, scientific instruments, optical communication, semiconductor, new energy

Mode HCSO-1800
Coating area Φ1800x H1000mm
Structure Vertical single door, All-In- One Box layout
Wavelength 380nm~780nm
Rotational speed 0~25RPM(variable)
Coating chamber pumping speed 4.0×10-3Pa≤30min
Ultimate vacuum 5.0×10-4Pa
Sputtering target Nb,Si,Cr,Al,In ...
Jig Unit Center Rotation Jig at the bottom
Vacuum Unit Low Vacuum Pump + High Vacuum Pump + Cryogenic Pump
Vacuum Controller Vacuum Controller, Penning Gauge, Pirani Gauge
Coating Unit DC + MF Magnetron Sputtering Source + Plasma Source
Charge Unit MFC + speedflo pressure controller
Thickness Controller Crystal Controller
Controller Industrial PC + TP
Application AR, Hard AR Coating, Hard Coating, Decorative Coating, HR Coating, etc.
Remark: Customization

Application cases.

AR, Hard AR Coating, Hard Coating, Decorative Coating, HR Coating, etc.

Mode HCSO-1300
Coating area Φ1300x H700mm
Structure Vertical single door, All-In- One Box layout
Wavelength 380nm~780nm
Rotational speed 0~100RPM(variable)
Coating chamber pumping speed 3.0×10-3Pa≤30min
Ultimate vacuum 2.0×10-4Pa
Sputtering target Nb,Si,Cr,Al,Ti ...
Jig Unit Center Rotation Jig at the bottom
Vacuum Unit Low Vacuum Pump + High Vacuum Pump + Cryogenic Pump
Vacuum Controller Vacuum Controller, Penning Gauge, Pirani Gauge
Coating Unit DC or MF Magnetron Sputtering Source + Plasma Source + Thermal Source
Charge Unit MFC or APC Automatic pressure controller
Thickness Controller Crystal Control or Optical Control
Controller Industrial PC + TP
Application AR, AF, Hard AR Coating, Hard Coating, Decorative Coating, HR Coating, etc.
Remark: Customization

Application cases.

数码科技(成像、显示、电路、结构装饰件),传统光学、眼镜,科学仪器、光通信、半导体、新能源

  • Know More Technology ?

    More
  • Need More Equipment ?

    More
  • Industry Solutions ?

    More
Would you like to know more?
Please contact us

E-mail: info@hcvac.com

Online Consultation

Submit