HCLAB series

Customized modular system

Vacuum Application Solution Supplier
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Experimental roll to roll vacuum coating machine

HCLAB series is a winding coating system based on modular, scalable and highly customizable platform, suitable for a variety of substrates and applications. It is designed for all processes and product qualification steps from laboratory to production. In addition, it is suitable for coating flexible glass.

HCLAB series uses the same key components as our wound coating systems for industrial production, but on a smaller scale, so our customers can test their applications in laboratory conditions and save time in upgrading their products to mass production.

HCLAB series concept offers a variety of winding system configurations. In addition, the roller section of the winding system can be reconfigured to meet new requirements and requirements.

HCLAB series machine is a small modular winding and coating system, which is specially designed for process and product certification from laboratory samples to mass production. In addition, it is also suitable for coating flexible glass. Although the machine is mainly suitable for small-scale production, it is also equipped with the same core components as the winding coating system for industrial production. As a result, our customers can test their applications in laboratory conditions and then scale up for mass production.

Product Advantage.

HCLAB series of experimental winding vacuum coating machine includes the following key capabilities:
  • Customization

    Design and produce according to different needs

  • Innovate

    Unique variable process layout

  • Multi purpose

    R&D or small scale production

  • Upgradeable

    Laboratory scale, efficient transfer of mass production

  • Flexible

    Flexible configuration of different winding systems

  • Multi process

    Diversified process options

Model HCLAB-300
Wide in width(mm) Max.300
Base material Polymer film, flexible glass, metal foil, textile, etc
Substrate thickness 23μm-250μm
Configurable process
RSM rotatable single magnetron Our mature rotating magnetron technology can achieve the highest target utilization and the best process stability. Double anode sputtering technique can also be used for single tube cathode.
RDM rotatable dual magnetron The double rotating device can be used for AC or bipolar power sputtering using two parts.
SSM standard single magnetron Reliable and standard single plane magnetron is suitable for all kinds of possible target materials for R & D and trial production.
Gas separation Separation coefficient between adjacent processes can reach a reliable 1:100.
Pretreatment glow discharge device Pretreatment components, such as glow discharge devices or linear ion sources, can be integrated to improve coating or coating parameters, such as adhesion.
PECVD,Heat evaporation The flexible process section is open to integrate specific customer coating components, such as PECVD or thermal evaporation.
Das double anode sputtering Long term stable DC sputtering is supported to reduce the thermal load on the sensitive substrate
Industry Proven reactive power sputtering control system using impedance control, PEM or advanced mode
Data analysis Latest process database for process data and retrospective trend analysis
Model HCLAB-600
Wide in width(mm) Max.600
Base material Polymer film, flexible glass, metal foil, textile, etc
Substrate thickness 23μm-250μm
Configurable process
RSM rotatable single magnetron Our mature rotating magnetron technology can achieve the highest target utilization and the best process stability. Double anode sputtering technique can also be used for single tube cathode.
RDM rotatable dual magnetron The double rotating device can be used for AC or bipolar power sputtering using two parts.
SSM standard single magnetron The reliable and standard single plane magnetron is suitable for all kinds of possible target materials for R & D and trial production.
Gas separation The separation coefficient between adjacent processes can reach a reliable 1:100.
Pretreatment glow discharge device Pretreatment components, such as glow discharge devices or linear ion sources, can be integrated to improve coating or coating parameters, such as adhesion.
PECVD,Heat evaporation The flexible process section is open to integrate specific customer coating components, such as PECVD or thermal evaporation.
Das double anode sputtering Long term stable DC sputtering is supported to reduce the thermal load on the sensitive substrate
Industry Proven reactive power sputtering control system using impedance control, PEM or advanced mode
Data analysis Latest process database for process data and retrospective trend analysis
Model HCLAB-900
Wide in width(mm) Max.900
Base material Polymer film, flexible glass, metal foil, textile, etc
Substrate thickness 23μm-250μm
Configurable process
RSM rotatable single magnetron Our mature rotating magnetron technology can achieve the highest target utilization and the best process stability. Double anode sputtering technique can also be used for single tube cathode.
RDM rotatable dual magnetron The double rotating device can be used for AC or bipolar power sputtering using two parts.
SSM standard single magnetron The reliable and standard single plane magnetron is suitable for all kinds of possible target materials for R & D and trial production.
Gas separation The separation coefficient between adjacent processes can reach a reliable 1:100.
Pretreatment glow discharge device Pretreatment components, such as glow discharge devices or linear ion sources, can be integrated to improve coating or coating parameters, such as adhesion.
PECVD,Heat evaporation The flexible process section is open to integrate specific customer coating components, such as PECVD or thermal evaporation.
Das double anode sputtering Long term stable DC sputtering is supported to reduce the thermal load on the sensitive substrate
Industry Proven reactive power sputtering control system using impedance control, PEM or advanced mode
Data analysis Latest process database for process data and retrospective trend analysis
Model HCLAB-1200
Wide in width(mm) Max.1200
Base material Polymer film, flexible glass, metal foil, textile, etc
Substrate thickness 23 μm-250 μm
Configurable process
RSM rotatable single magnetron Our mature rotating magnetron technology can achieve the highest target utilization and the best process stability. Double anode sputtering technique can also be used for single tube cathode.
RDM rotatable dual magnetron The double rotating device can be used for AC or bipolar power sputtering using two parts.
SSM standard single magnetron Reliable and standard single plane magnetron is suitable for all kinds of possible target materials for R & D and trial production.
Gas separation Separation coefficient between adjacent processes can reach a reliable 1:100.
Pretreatment glow discharge device Pretreatment components, such as glow discharge devices or linear ion sources, can be integrated to improve coating or coating parameters, such as adhesion.
PECVD,Heat evaporation The flexible process section is open to integrate specific customer coating components, such as PECVD or thermal evaporation.
Das double anode sputtering Long term stable DC sputtering is supported to reduce the thermal load on the sensitive substrate
Industry Proven reactive power sputtering control system using impedance control, PEM or advanced mode
Data analysis Latest process database for process data and retrospective trend analysis
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